Husch Blackwell welcomes Associate Daan G. Erikson to its Omaha, Neb., office. Erikson will concentrate his practice on intellectual property matters.
Prior to joining Husch Blackwell, Erikson served as a senior research and conference fellow at the Fordham Intellectual Property Institute in New York, where he researched and drafted memoranda, reports and summaries analyzing all areas of domestic and international intellectual property law, cases and practices. Erikson also previously served as an associate at a small intellectual property firm in New York, where he assisted with copyright, trademark and defamation law litigation and transactional matters.
Erikson received his J.D. from Loyola Law School in Los Angeles (2012). During law school, he spent a summer studying abroad through Loyola’s London International Intellectual Property Institute and interned with HBO in Santa Monica, Calif., where he drafted talent, acquisition and licensing agreements, and researched copyright law issues. For his final year of law school, he attended Fordham University School of Law in New York as a visiting student. Erikson received his B.A., cum laude, from the Gallatin School of Individualized Study at New York University (2009).
Husch Blackwell’s Intellectual Property team is able to provide comprehensive counsel regarding intellectual property matters as it relates precisely to a client’s tailored needs. With substantial experience in clearing, evaluating, securing, managing and enforcing trademarks, service marks, copyrights, trade dress, and product and packaging configurations worldwide, the group is equipped to manages clients’ domestic and global trademark estates and provide surveillance of marks worldwide.